Tuning the work function of nickel oxide using triethoxysilane functionalized monolayers-Reference-Cited by-同舟云学术

Tuning the work function of nickel oxide using triethoxysilane functionalized monolayers

Published:2021 Issue:3 Volume:23 Page:2449-2457
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Chen Gang¹²³⁴,Wang Xinquan¹²³⁴,Shi Yuting⁵²³⁴,Tinkham Jonathan S.⁵²³⁴,Brenner Thomas M.¹²³⁴,Olson Dana C.⁶³⁴,Sellinger Alan⁵²³⁴^ORCID,Furtak Thomas E.¹²³⁴^ORCID

Affiliation:

1. Department of Physics

2. Colorado School of Mines

3. Golden

4. USA

5. Department of Chemistry

6. National Renewable Energy Laboratory

Abstract

We have synthesized a family of styryl-based molecules that have been attached to nickel oxide films using a novel ethoxysilane chemistry to modify the work function over a range of 900 meV.

Funder

National Science Foundation

U.S. Department of Energy

Indo-US Science and Technology Forum

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2021/CP/D0CP03306E

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4. Bulk-Heterojunction Organic Solar Cells: Five Core Technologies for Their Commercialization

5. Critical review of the molecular design progress in non-fullerene electron acceptors towards commercially viable organic solar cells

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