The effect of complexing agents in chemical solution deposition of metal chalcogenide thin films

Author:

Sengupta Sucheta1234ORCID,Aggarwal Rinki1234,Golan Yuval56789ORCID

Affiliation:

1. Amity Institute of Advanced Research and Studies (Materials and Devices)

2. Amity University

3. Noida

4. India

5. Department of Materials Engineering

6. Ben-Gurion University of the Negev

7. Beer-Sheva 8410501

8. Israel

9. Ilse Katz Institute for Nanoscale Science and Technology

Abstract

This review article gives an overview of different complexing agents used during chemical deposition of metal chalcogenide thin films and their role in controlling the resultant morphology by effective complexation of the metal ion.

Funder

Israel Science Foundation

Department of Science and Technology, Ministry of Science and Technology

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Materials Science

Reference143 articles.

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4. J. George , Preparation of Thin Films , CRC Press , 1992

5. G. Hodes , Chemical Solution Deposition of Semiconductor Films , Marcel Dekker, Inc , New York , 2002

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