Tuning the optical band gap and electrical properties of NiO thin films by nitrogen doping: a joint experimental and theoretical study

Author:

Wang Yong12,Bruyère Stéphanie3,Kumagai Yu4,Tsunoda Naoki4,Oba Fumiyasu4,Ghanbaja Jaafar3,Sun Hui1,Dai Bo2,Pierson Jean-François3ORCID

Affiliation:

1. School of Space Science and Physics, Shandong University, Weihai 264209, China

2. State Key Laboratory of Environmental-Friendly Energy Materials, Southwest University of Science and Technology, Mianyang 621010, China

3. Institut Jean Lamour, UMR 7198-CNRS, Université de Lorraine, Nancy 54011, France

4. Laboratory for Materials and Structures, Institute of Innovative Research, Tokyo Institute of Technology, Yokohama 226-8503, Japan

Abstract

A joint experimental and theoretical study is presented to reveal the influence of nitrogen doping on the optical and electrical properties of NiO thin films.

Funder

National Natural Science Foundation of China

State Key Laboratory of Environmental-friendly Energy Materials

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

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