Trapping chlorine radicals via substituting nitro radicals in the gas phase

Author:

Seto Akira1234,Ochi Yuki1234,Gotoh Hiroaki1234,Sakakibara Kazuhisa1234,Hatazawa Shota1234,Seki Kanekazu1234,Saito Naoaki564,Mishima Yuji74

Affiliation:

1. Department of Advanced Materials Chemistry

2. Yokohama National University

3. Yokohama 240-8501

4. Japan

5. National Institute of Advanced Industrial Science and Technology

6. Tsukuba

7. Kobe Material Testing Laboratory Co., Ltd

Abstract

Chlorine radicals (Cl˙), generated by the YAG laser photolysis (λ = 355 nm) of Cl2 in the gas phase, were captured by using 2,2-diphenyl-1-picrylhydrazyl (DPPH˙) and were characterized using ion attachment ionization-quadrupole mass spectrometry.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Engineering,General Chemical Engineering,Analytical Chemistry

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