Trapping chlorine radicals via substituting nitro radicals in the gas phase
Author:
Affiliation:
1. Department of Advanced Materials Chemistry
2. Yokohama National University
3. Yokohama 240-8501
4. Japan
5. National Institute of Advanced Industrial Science and Technology
6. Tsukuba
7. Kobe Material Testing Laboratory Co., Ltd
Abstract
Chlorine radicals (Cl˙), generated by the YAG laser photolysis (λ = 355 nm) of Cl2 in the gas phase, were captured by using 2,2-diphenyl-1-picrylhydrazyl (DPPH˙) and were characterized using ion attachment ionization-quadrupole mass spectrometry.
Publisher
Royal Society of Chemistry (RSC)
Subject
General Engineering,General Chemical Engineering,Analytical Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2016/AY/C5AY01118C
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