Fabrication of glass-based microfluidic devices with dry film photoresists as pattern transfer masks for wet etching
Author:
Affiliation:
1. School of Chemical Engineering
2. Sichuan University
3. Chengdu
4. China
5. State Key Laboratory of Polymer Materials Engineering
Abstract
A simple, cheap and rapid method is developed to fabricate glass microfluidic devices with dry film photoresist as pattern transfer masks for wet etching, which provides an efficient approach for mass-production of glass microchips.
Funder
National Natural Science Foundation of China
Publisher
Royal Society of Chemistry (RSC)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2015/RA/C4RA15907A
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