Rapid identification of ultrathin amorphous damage on monocrystalline silicon surface-Reference-Cited by-同舟云学术

Rapid identification of ultrathin amorphous damage on monocrystalline silicon surface

Published:2020 Issue:23 Volume:22 Page:12987-12995
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Wu Lei¹²³⁴⁵,Yu Bingjun¹²³⁴⁵^ORCID,Zhang Pei¹²³⁴⁵,Feng Chengqiang¹²³⁴⁵,Chen Peng¹²³⁴⁵,Deng Liang¹²³⁴⁵,Gao Jian¹²³⁴⁵,Chen Siming⁶⁷⁸⁹,Jiang Shulan¹²³⁴⁵,Qian Linmao¹²³⁴⁵^ORCID

Affiliation:

1. Tribology Research Institute

2. State Key Laboratory of Traction Power

3. Southwest Jiaotong University

4. Chengdu 610031

5. China

6. Department of Electronic and Electrical Engineering

7. University College London

8. London WC1E 7JE

9. UK

Abstract

Amorphous Si damage with a thickness of several nanometers and its spatial distributions can be rapidly identified by selective etching.

Funder

National Natural Science Foundation of China

Sichuan Province Science and Technology Support Program

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2020/CP/D0CP01370F

Reference43 articles.

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5. Nanoscratch-induced deformation of single crystal silicon

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