Patterning 2D materials for devices by mild lithography
Author:
Affiliation:
1. Institute of Experimental Physics I and Center for Materials Research (ZfM), Justus Liebig University Giessen, Heinrich-Buff-Ring 16, DE-35392 Giessen, Germany
Abstract
Funder
Deutsche Forschungsgemeinschaft
Publisher
Royal Society of Chemistry (RSC)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2021/RA/D1RA04982H
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3. Lithography gets extreme
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