Solution-processed high-<i>k</i> photopatternable polymers for low-voltage electronics-Reference-Cited by-同舟云学术

Solution-processed high-k photopatternable polymers for low-voltage electronics

Published:2024 Issue: Volume: Page:
ISSN:2051-6347
Container-title:Materials Horizons
language:en
Short-container-title:Mater. Horiz.

Author:

Sun Qingqing¹^ORCID,Ge Hongwei¹,Wang Shuai¹,Zhang Xiaohang¹,Zhang Juzhong¹^ORCID,Li Shisheng²,Yao Zhiqiang¹^ORCID,Zhang Lei³^ORCID,Liu Xuying¹^ORCID

Affiliation:

1. School of Materials Science and Engineering, State Key Laboratory of Structural Analysis, Optimization and CAE Software for Industrial Equipment, National Engineering Research Center for Advanced Polymer Processing Technology Zhengzhou University, Zhengzhou 450001, China

2. Research Center for Functional Materials, National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044, Japan

3. Beijing Advanced Innovation Center for Soft Matter Science and Engineering, Beijing University of Chemical Technology, Beijing 100029, China

Abstract

Cross-linkable high-k polymers were synthesized to exhibit good solution-processability and high-resolution photo-patternability, and allowed for fabricating large-area flexible electronics and pattern recognition devices in a large scale.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Link

http://pubs.rsc.org/en/content/articlepdf/2024/MH/D4MH00725E

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