The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films-Reference-Cited by-同舟云学术

The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films

Published:2020 Issue:49 Volume:10 Page:29394-29401
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Abinaya Chandrasekaran¹²³⁴⁵,Bethke Kevin⁶⁷⁸⁹^ORCID,Andrei Virgil⁶⁷⁸⁹^ORCID,Baumann Jonas¹⁰¹¹¹²⁹^ORCID,Pollakowski-Herrmann Beatrix¹³¹⁴⁹,Kanngießer Birgit¹⁰¹¹¹²⁹,Beckhoff Burkhard¹³¹⁴⁹,Vásquez G. Cristian¹⁵¹⁶¹⁷¹⁸,Mayandi Jeyanthinath¹²³⁴⁵^ORCID,Finstad Terje G.¹⁵¹⁶¹⁷¹⁸,Rademann Klaus⁶⁷⁸⁹^ORCID

Affiliation:

1. Department of Materials Science

2. School of Chemistry

3. Madurai Kamaraj University

4. Madurai-625021

5. India

6. Department of Chemistry

7. Humboldt-Universität zu Berlin

8. 12489 Berlin

9. Germany

10. Technical University of Berlin

11. Institute of Optics and Atomic Physics

12. D-10587 Berlin

13. Physikalisch-Technische Bundesanstalt (PTB)

14. 10587 Berlin

15. Centre for Materials Science and Nanotechnology

16. University of Oslo

17. N-0318 Oslo

18. Norway

Abstract

This study reveals the interplay between the composition and thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by varying the annealing atmosphere.

Funder

Deutscher Akademischer Austauschdienst

Bayer-Stiftungen

Deutsche Forschungsgemeinschaft

Norges Forskningsråd

Department of Science and Technology, Ministry of Science and Technology, India

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2020/RA/D0RA03906C