Effects of precursor pre-treatment on the vapor deposition of WS2 monolayers-Reference-Cited by-同舟云学术

Effects of precursor pre-treatment on the vapor deposition of WS2 monolayers

Published:2019 Issue:3 Volume:1 Page:953-960
ISSN:2516-0230
Container-title:Nanoscale Advances
language:en
Short-container-title:Nanoscale Adv.

Author:

Pam Mei Er¹²³⁴⁵,Shi Yumeng¹²³⁴⁶,Hu Junping¹²³⁴,Zhao Xiaoxu⁷⁸⁹⁴^ORCID,Dan Jiadong⁷⁸⁹⁴,Gong Xue¹²³⁴⁶,Huang Shaozhuan¹²³⁴,Geng Dechao¹²³⁴,Pennycook Stephen¹⁰⁸¹¹⁴¹²,Ang Lay Kee¹²³⁴⁵,Yang Hui Ying¹²³⁴^ORCID

Affiliation:

1. Pillar of Engineering Product Development

2. Singapore University of Technology and Design

3. Singapore 487372

4. Singapore

5. Science and Math Cluster

6. International Collaborative Laboratory of 2D Materials for Optoelectronic Science & Technology of Ministry of Education

7. Department of Chemistry

8. National University of Singapore

9. Singapore 117543

10. Department of Materials Science and Engineering

11. Singapore 117575

12. NUS Graduate School for Integrative Sciences and Engineering

Abstract

Transition metal oxide powders have been widely used as the growth precursors for monolayer transition metal dichalcogenides (TMDCs) in chemical vapor deposition (CVD).

Funder

National Natural Science Foundation of China

Agency for Science, Technology and Research

Publisher

Royal Society of Chemistry (RSC)

Subject

General Engineering,General Materials Science,General Chemistry,Atomic and Molecular Physics, and Optics,Bioengineering

Link

http://pubs.rsc.org/en/content/articlepdf/2019/NA/C8NA00212F

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