Atomic layer deposition of dielectric Y2O3 thin films from a homoleptic yttrium formamidinate precursor and water
Author:
Affiliation:
1. Inorganic Materials Chemistry
2. Ruhr University Bochum
3. 44801 Bochum
4. Germany
5. Microsystems Technology
6. RUBION
Abstract
In this work, the application of tris(N,N′-diisopropyl-formamidinato)yttrium(iii) [Y(DPfAMD)3] as a precursor in a water-assisted thermal atomic layer deposition (ALD) process for the fabrication of device quality Y2O3 thin films is demonstrated.
Funder
Deutsche Forschungsgemeinschaft
Bundesministerium für Bildung und Forschung
Publisher
Royal Society of Chemistry (RSC)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2021/RA/D0RA09876K
Reference45 articles.
1. Electronic structure of yttrium oxide
2. Yttrium oxide/silicon dioxide: a new dielectric structure for VLSI/ULSI circuits
3. Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
4. Plasma-Resistant Dense Yttrium Oxide Film Prepared by Aerosol Deposition Process
5. Arbeiten im Gebiet hoher Temperaturen I. Über das Schmelzen und Verdampfen unserer feuerbeständigsten Oxyde im elektrischen Vakuumofen
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Interplay of Precursor and Plasma for The Deposition of HfO2 via PEALD: Film Growth and Dielectric Properties;Advanced Materials Interfaces;2023-07-24
2. Assessing the Environmental Impact of Atomic Layer Deposition (ALD) Processes and Pathways to Lower It;ACS Materials Au;2023-04-27
3. Synthesis of spherical Y2O3:Er emitting particles with variable radial composition by controlled double-jet precipitation of layered precursors;Particuology;2023-03
4. Atomic layer deposition of Y2O3 films using a novel liquid homoleptic yttrium precursor tris(sec-butylcyclopentadienyl)yttrium [Y(sBuCp)3] and water;RSC Advances;2023
5. Liquid injection field desorption/ionization as a powerful tool to characterize volatile, labile, and reactive metal–organic complexes;European Journal of Mass Spectrometry;2022-12-29
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3