Enhanced crystallization by the virtue of the complete confinement of a ultrathin poly(3-hexylthiophene) film during the patterning process-Reference-Cited by-同舟云学术

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Enhanced crystallization by the virtue of the complete confinement of a ultrathin poly(3-hexylthiophene) film during the patterning process

Published:2021 Issue:27 Volume:45 Page:12219-12226
ISSN:1144-0546
Container-title:New Journal of Chemistry
language:en
Short-container-title:New J. Chem.

Author:

Wang Tao¹²³⁴⁵,Qian Menxiang¹²³⁴⁵,Wu Kun¹²³⁴⁵,Ding Guangzhu¹²³⁴⁵^ORCID,Liu Jieping¹²³⁴⁵

Affiliation:

1. College of Chemistry and Materials Science

2. Huaibei Normal University

3. Huaibei 235000

4. China

5. Anhui Key Laboratory of Energetic Materials

Abstract

The enhanced crystallization of the patterned poly(3-hexylthiophene) film based on the nanoimprinting lithography technique due to complete confinement.

Funder

National Natural Science Foundation of China

Anhui Department of Education

Natural Science Foundation of Anhui Province

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry,Catalysis

Link

http://pubs.rsc.org/en/content/articlepdf/2021/NJ/D1NJ01017D

Reference35 articles.

1. Large-Area High Aspect Ratio Plasmonic Interference Lithography Utilizing a Single High-k Mode

2. Pushing deep ultraviolet lithography to its limits

3. E-beam lithography for micro-/nanofabrication

4. Imprint of sub‐25 nm vias and trenches in polymers

5. Nanoimprint Lithography: Methods and Material Requirements

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