Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1−xN thin films at low temperatures-Reference-Cited by-同舟云学术

Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1−xN thin films at low temperatures

Published:2014 Issue:12 Volume:2 Page:2123-2136
ISSN:2050-7526
Container-title:J. Mater. Chem. C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Ozgit-Akgun Cagla¹²³⁴²,Goldenberg Eda¹²³,Okyay Ali Kemal¹²³⁴²,Biyikli Necmi¹²³⁴²

Affiliation:

1. UNAM – National Nanotechnology Research Center

2. Bilkent University

3. Ankara, Turkey

4. Institute of Materials Science and Nanotechnology

Abstract

The authors report on the use of hollow cathode plasma for low-temperature plasma-assisted atomic layer deposition (PA-ALD) of crystalline AlN, GaN and Al_xGa_1−xN thin films with low impurity concentrations.

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2014/TC/C3TC32418D

Reference70 articles.

1. III–nitrides: Growth, characterization, and properties

2. When group-III nitrides go infrared: New properties and perspectives

3. High quality AlN grown on SiC by metal organic chemical vapor deposition

4. Characterization of InN layers grown by high-pressure chemical vapor deposition

5. A comparative study of GaN epilayers grown on sapphire and SiC substrates by plasma‐assisted molecular‐beam epitaxy

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