Overcoming pulse mixing and signal tailing in laser ablation inductively coupled plasma mass spectrometry depth profiling
Author:
Publisher
Royal Society of Chemistry (RSC)
Subject
Spectroscopy,Analytical Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2005/JA/B509379C
Reference18 articles.
1. Ion beams in silicon processing and characterization
2. Ion implantation for silicon device manufacturing: A vacuum perspective
3. Plasma immersion ion implantation—a fledgling technique for semiconductor processing
4. Key issues in plasma-source ion implantation
Cited by 35 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Imaging the Chemistry of Materials Kinetics;CHIMIA;2022-03-30
2. High-precision mapping of fluorine and lithium in energy materials by means of laser-induced XUV spectroscopy (LIXS);Spectrochimica Acta Part B: Atomic Spectroscopy;2021-07
3. Laser Ablation–Inductively Coupled Plasma–Mass Spectrometry Imaging in Biology;Chemical Reviews;2021-05-21
4. 3D Chemical Mapping of Thin Films by Means of X-Ray Laser Microanalysis;Springer Proceedings in Physics;2020
5. Soft X-ray laser ablation for nano-scale chemical mapping microanalysis;Journal of Analytical Atomic Spectrometry;2020
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3