Chemical vapour deposition of graphene on copper–nickel alloys: the simulation of a thermodynamic and kinetic approach-Reference-Cited by-同舟云学术

Chemical vapour deposition of graphene on copper–nickel alloys: the simulation of a thermodynamic and kinetic approach

Published:2020 Issue:28 Volume:12 Page:15283-15294
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Al-Hilfi Samir H.¹²³⁴⁵^ORCID,Derby Brian⁵⁶⁷⁸^ORCID,Martin Philip A.⁹⁶⁷⁸,Whitehead J. Christopher¹⁰⁶⁷⁸^ORCID

Affiliation:

1. School of Applied Sciences

2. University of Technology

3. Baghdad

4. Iraq

5. Department of Materials

6. The University of Manchester

7. Manchester

8. UK

9. Department of Chemical Engineering and Analytical Sciences

10. Department of Chemistry

Abstract

The thermodynamic simulation shows that the deposition driving force is greatest for high carbon to hydrogen ratios and reaches a maximum around 850 °C.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2020/NR/D0NR00302F

Reference79 articles.

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2. Electric Field Effect in Atomically Thin Carbon Films

3. Evolution of Graphene Growth on Ni and Cu by Carbon Isotope Labeling

4. Sub-surface nucleation of graphene precursors near a Ni(111) step-edge

5. Influence of Gas Phase Equilibria on the Chemical Vapor Deposition of Graphene

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