Plasmonic lithography for the fabrication of surface nanostructures with a feature size down to 9 nm-Reference-Cited by-同舟云学术

Plasmonic lithography for the fabrication of surface nanostructures with a feature size down to 9 nm

Published:2020 Issue:4 Volume:12 Page:2415-2421
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Gao Ping¹²³⁴⁵,Pu Mingbo¹²³⁴⁵,Ma Xiaoliang¹²³⁴⁵,Li Xiong¹²³⁴⁵,Guo Yinghui¹²³⁴⁵,Wang Changtao¹²³⁴⁵,Zhao Zeyu¹²³⁴⁵,Luo Xiangang¹²³⁴⁵^ORCID

Affiliation:

1. State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering

2. Institute of Optics and Electronics

3. Chinese Academy of Science

4. Chengdu 610209

5. China

Abstract

Aiming to further improve the resolution and quality of plasmonic lithography, a self-aligned patterning technique is introduced to it to obtain ultrafine nanopatterns with high contrast and low LER.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2020/NR/C9NR08153D

Reference46 articles.

1. Patterning of Flexible Transparent Thin-Film Transistors with Solution-Processed ZnO Using the Binary Solvent Mixture

2. Plasmonic nanoresonators for high-resolution colour filtering and spectral imaging

3. Efficiency Enhancement of Organic Solar Cells Using Transparent Plasmonic Ag Nanowire Electrodes

4. Catenary optics for achromatic generation of perfect optical angular momentum

5. A planar chiral meta-surface for optical vortex generation and focusing

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