A planar ultraviolet objective lens for optical axis free imaging nanolithography by employing optical negative refraction-Reference-Cited by-同舟云学术

A planar ultraviolet objective lens for optical axis free imaging nanolithography by employing optical negative refraction

Published:2022 Issue:8 Volume:4 Page:2011-2017
ISSN:2516-0230
Container-title:Nanoscale Advances
language:en
Short-container-title:Nanoscale Adv.

Author:

Kong Weijie¹²,Liu Ling¹²,Wang Changtao¹²,Pu Mingbo¹²,Gao Ping¹,Liu Kaipeng¹²,Luo Yunfei¹²,Jin Qijian¹,Zhao Chengwei¹²,Luo Xiangang¹²^ORCID

Affiliation:

1. State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China

2. School of Optoelectronics, University of Chinese Academy of Sciences, Beijing 100049, China

Abstract

Optical axis free imaging nanolithography could be achieved using a planar ultraviolet objective lens composed of a hyperbolic metamaterial.

Funder

Youth Innovation Promotion Association of the Chinese Academy of Sciences

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Engineering,General Materials Science,General Chemistry,Atomic and Molecular Physics, and Optics,Bioengineering

Link

http://pubs.rsc.org/en/content/articlepdf/2022/NA/D1NA00883H

Reference36 articles.

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4. Engineering Optics 2.0: A Revolution in Optical Materials, Devices, and Systems

5. Subwavelength Artificial Structures: Opening a New Era for Engineering Optics

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