The roles of the oxygen vacancies caused by the ion doping method in catalytic materials and their applications in advanced oxidation processes
Author:
Affiliation:
1. College of Environmental Science and Engineering, Hunan University, Changsha, 410082, P. R. China
2. Key Laboratory of Environmental Biology and Pollution Control, Hunan University, Ministry of Education, Changsha, 410082, P. R. China
Abstract
Funder
China Postdoctoral Science Foundation
National Natural Science Foundation of China
Natural Science Foundation of Hunan Province
Science and Technology Bureau, Changsha
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry,Catalysis
Link
http://pubs.rsc.org/en/content/articlepdf/2023/NJ/D3NJ04403C
Reference149 articles.
1. Advanced oxidation processes: Performance, advantages, and scale-up of emerging technologies
2. Metal-carbon hybrid materials induced persulfate activation: Application, mechanism, and tunable reaction pathways
3. Surface oxygen vacancy inducing peroxymonosulfate activation through electron donation of pollutants over cobalt-zinc ferrite for water purification
4. Peroxydisulfate activation by sulfur-doped ordered mesoporous carbon: Insight into the intrinsic relationship between defects and 1O2 generation
5. Oxygen Vacancy Associated Surface Fenton Chemistry: Surface Structure Dependent Hydroxyl Radicals Generation and Substrate Dependent Reactivity
Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Enhanced activation of peroxymonosulfate with cobalt-doped manganese-iron oxides for contaminant degradation: Regulation of oxygen vacancy defects;Journal of Colloid and Interface Science;2025-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3