Structural insight into an atomic layer deposition (ALD) grown Al2O3 layer on Ni/SiO2: impact on catalytic activity and stability in dry reforming of methane-Reference-Cited by-同舟云学术

Structural insight into an atomic layer deposition (ALD) grown Al2O3 layer on Ni/SiO2: impact on catalytic activity and stability in dry reforming of methane

Published:2021 Issue:23 Volume:11 Page:7563-7577
ISSN:2044-4753
Container-title:Catalysis Science & Technology
language:en
Short-container-title:Catal. Sci. Technol.

Author:

Kim Sung Min¹^ORCID,Armutlulu Andac¹^ORCID,Liao Wei-Chih²,Hosseini Davood¹,Stoian Dragos³^ORCID,Chen Zixuan¹,Abdala Paula M.¹^ORCID,Copéret Christophe²^ORCID,Müller Christoph¹^ORCID

Affiliation:

1. Department of Mechanical and Process Engineering, ETH Zurich, Leonhardstrasse 27, 8092 Zurich, Switzerland

2. Department of Chemistry and Applied Sciences, ETH Zurich, Vladimir Prelog Weg 1-5, 8093 Zurich, Switzerland

3. Swiss–Norwegian Beamlines, ESRF, BP 220, Grenoble, 38043, France

Abstract

Improving the stability of Ni-based dry reforming catalysts is a key challenge. ALD-grown Al2O3 overcoats deposited onto Ni/SiO2 prevent the sintering of Ni, reduce deactivation by coke and inhibit the formation of inactive NiAl2O4 on time on stream.

Funder

H2020 European Research Council

Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung

Eidgenössische Technische Hochschule Zürich

Publisher

Royal Society of Chemistry (RSC)

Subject

Catalysis

Link

http://pubs.rsc.org/en/content/articlepdf/2021/CY/D1CY01149A

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