Compositional defects in a MoAlB MAB phase thin film grown by high-power pulsed magnetron sputtering-Reference-Cited by-同舟云学术

Compositional defects in a MoAlB MAB phase thin film grown by high-power pulsed magnetron sputtering

Published:2023 Issue:43 Volume:15 Page:17356-17363
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Sahu Rajib¹²^ORCID,Bogdanovski Dimitri²^ORCID,Achenbach Jan-Ole²^ORCID,Hans Marcus²^ORCID,Primetzhofer Daniel³^ORCID,Schneider Jochen M.¹²^ORCID,Scheu Christina¹⁴^ORCID

Affiliation:

1. Max-Planck-Institut für Eisenforschung GmbH, Max-Planck-Str. 1, 40237 Düsseldorf, Germany

2. Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, 52074 Aachen, Germany

3. Department of Physics and Astronomy, Uppsala University, Box 516, S-75120 Uppsala, Sweden

4. Materials Analytics, RWTH Aachen University, Kopernikusstr. 10, 52074 Aachen, Germany

Abstract

Various compositional defects such as Mo3Al2B4, Mo4Al3B4, Mo6Al5B6 and Al3Mo, together with MoB MBene, are observed to be coexisting in a MoAlB MAB phase thin film grown at 800 °C by high-power pulsed magnetron sputtering.

Funder

Max-Planck-Gesellschaft

Uppsala Universitet

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2023/NR/D3NR04233B

Reference32 articles.

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3. Bonding and classification of nanolayered ternary carbides

4. Microstructure and Wear Behaviors of Plasma-Sprayed MoAlB Ceramic Coating

5. Synthesis and Properties of Orthorhombic MoAlB Coatings

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