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Atomic layer deposition for membrane interface engineering

Published:2018 Issue:44 Volume:10 Page:20505-20513
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Yang Hao-Cheng¹²³⁴^ORCID,Waldman Ruben Z.⁵⁶⁷⁸⁹^ORCID,Chen Zhaowei¹⁰¹¹¹²⁸^ORCID,Darling Seth B.⁵⁶⁷⁸⁹^ORCID

Affiliation:

1. School of Chemical Engineering and Technology

2. Sun Yat-Sen University

3. Zhuhai

4. China

5. Institute for Molecular Engineering

6. University of Chicago

7. Chicago

8. USA

9. Chemical Sciences and Engineering Division

10. Center for Nanoscale Materials

11. Argonne National Laboratory

12. Lemont

Abstract

Atomic layer deposition represents a burgeoning and appealing technique for membrane interface engineering.

Funder

Basic Energy Sciences

Sun Yat-sen University

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2018/NR/C8NR08114J

Reference78 articles.

1. Materials for next-generation desalination and water purification membranes

2. Membrane-based processes for sustainable power generation using water

3. Perspective: Interfacial materials at the interface of energy and water

4. Crises and opportunities at the energy-water interface

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