Oxygen incorporated solution-processed high-κ La2O3 dielectrics with large-area uniformity, low leakage and high breakdown field comparable with ALD deposited films

Author:

Yan Longsen12345,He Waner12345,Liang Xiaoci6745,Liu Chuan6745,Lu Xihong8910117ORCID,Luo Chunlai12345,Zhang Aihua12345,Tao Ruiqiang12345,Fan Zhen12345ORCID,Zeng Min12345,Ning Honglong12131445ORCID,Zhou Guofu152345,Lu Xubing12345ORCID,Liu Junming12345ORCID

Affiliation:

1. Institute for Advanced Material and Guangdong Provincial Key Laboratory of Optical Information Materials and Technology

2. South China Academy of Advanced Optoelectronics

3. South China Normal University

4. Guangzhou

5. China

6. State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology

7. Sun Yat-Sen University

8. MOE of the Key Laboratory of Bioinorganic and Synthetic Chemistry

9. The Key Lab of Low-Carbon Chem and Energy Conservation of Guangdong Province

10. KLGHEI of Environment and Energy Chemistry

11. School of Chemistry

12. State Key Laboratory of Luminescent Materials and Devices

13. Institute of Polymer Optoelectronic Materials and Devices

14. South China University of Technology

15. Institute of Electronic Paper Displays and Guangdong Provincial Key Laboratory of Optical Information Materials and Technology

Abstract

Oxygen incorporated solution-processed high-κ La2O3 dielectrics exhibit large-area uniformity, low leakage and high breakdown field comparable with ALD deposited films.

Funder

National Natural Science Foundation of China

Higher Education Discipline Innovation Project

Guangdong Province Introduction of Innovative R&D Team

Science and Technology Planning Project of Guangdong Province

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

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