High resolution patterning of PbS quantum dots/graphene photodetectors with high responsivity via photolithography with a top graphene layer to protect surface ligands-Reference-Cited by-同舟云学术

High resolution patterning of PbS quantum dots/graphene photodetectors with high responsivity via photolithography with a top graphene layer to protect surface ligands

Published:2021 Issue:21 Volume:3 Page:6206-6212
ISSN:2516-0230
Container-title:Nanoscale Advances
language:en
Short-container-title:Nanoscale Adv.

Author:

Ahn Seungbae¹^ORCID,Chen Wenjun¹,Vazquez-Mena Oscar¹^ORCID

Affiliation:

1. Department of Nanoengineering, Center for Memory and Recording Research, Calibaja Center for Resilient Materials and Systems, University of California San Diego, 9500 Gilman Drive, La Jolla, CA, 92093, USA

Abstract

We use a top-graphene layer to protect QD surface ligands during the lithography process, allowing reliable patterning of hybrid Gr/QD photodetectors via lithography and dry etching.

Funder

Division of Electrical, Communications and Cyber Systems

Kwanjeong Educational Foundation

National Science Foundation

Publisher

Royal Society of Chemistry (RSC)

Subject

General Engineering,General Materials Science,General Chemistry,Atomic and Molecular Physics, and Optics,Bioengineering

Link

http://pubs.rsc.org/en/content/articlepdf/2021/NA/D1NA00582K

Reference29 articles.

1. Colloidal quantum dots for optoelectronics