Highly stable thiol–ene systems: from their structure–property relationship to DLP 3D printing-Reference-Cited by-同舟云学术

Highly stable thiol–ene systems: from their structure–property relationship to DLP 3D printing

Published:2018 Issue:43 Volume:6 Page:11561-11568
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Chen Li¹²³⁴⁵,Wu Qingyang⁵⁶⁷²³,Wei Guo⁵⁶⁷²³,Liu Ren¹²³⁴⁵^ORCID,Li Zhiquan¹²³⁴⁵^ORCID

Affiliation:

1. International Research Center for Photoresponsive Molecules and Materials

2. Jiangnan University

3. Wuxi

4. China

5. Key Laboratory of Synthetic and Biological Colloids

6. Ministry of Education

7. School of Chemical and Material Engineering

Abstract

Highly stable secondary thiol–ene systems with low shrinkage were successfully applied to DLP 3D printing to fabricate objects with a vertical resolution of 50 μm.

Funder

National Natural Science Foundation of China

Ministry of Education of the People's Republic of China

State Administration of Foreign Experts Affairs

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2018/TC/C8TC03389G

Reference34 articles.

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