Deep X-ray lithography on “sol–gel” processed noble metal mesoarchitectured films-Reference-Cited by-同舟云学术

Deep X-ray lithography on “sol–gel” processed noble metal mesoarchitectured films

Published:2022 Issue:5 Volume:14 Page:1706-1712
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Gayrard Maxime¹,Marmiroli Benedetta²^ORCID,Chancerel Francois¹³⁴,Decorse Philippe⁵,Amenitsch Heinz²,Peron Jennifer⁵^ORCID,Cattoni Andrea³⁴^ORCID,Faustini Marco¹^ORCID

Affiliation:

1. Sorbonne Université, CNRS, Laboratoire Chimie de la Matière Condensée de Paris (LCMCP), F-75005 Paris, France

2. Institute of Inorganic Chemistry, Graz University of Technology, Graz, Austria

3. Institut Photovoltaïque d'Ile-de-France (IPVF), CNRS UMR 9006, Palaiseau, France

4. Centre de Nanosciences et de Nanotechnologies (C2N), CNRS UMR 9001, Université Paris-Saclay, Palaiseau, France

5. Université de Paris, ITODYS, CNRS, UMR 7086, 15 rue J-A de Baïf, F-75013 Paris, France

Abstract

Noble metal coordination xerogel exhibit solubility switch when exposed to X-rays. The films can be used as recyclable negative tone resists for deep X-ray lithography that can be converted into metallic nanoarchitectured films.

Funder

H2020 European Research Council

Agence Nationale de la Recherche

Commissariat Général à l'Investissement

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2022/NR/D1NR07455E

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