Design of lamellar structured POSS/BPZ polybenzoxazine nanocomposites as a novel class of ultra low-k dielectric materials-Reference-Cited by-同舟云学术

Design of lamellar structured POSS/BPZ polybenzoxazine nanocomposites as a novel class of ultra low-k dielectric materials

Published:2014 Issue:37 Volume:4 Page:19127-19136
ISSN:2046-2069
Container-title:RSC Adv.
language:en
Short-container-title:RSC Adv.

Author:

Sasi kumar R.¹²³⁴⁵,Ariraman M.¹²³⁴⁵,Alagar M.¹²³⁴⁵

Affiliation:

1. Polymer Composite Lab

2. Department of Chemical Engineering

3. A.C.Tech.

4. Anna University

5. Chennai-600 025, India

Abstract

A novel class of lamellar structured polyhedral oligomeric silsesquioxane/bisphenol Z (POSS/BPZ) polybenzoxazine (PBz) nanocomposites was successfully designed by a facile one-step copolymerization technique.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2014/RA/C4RA01905A

Reference38 articles.

1. New High Strength Low-k Spin-On Thin Films for IC Application

2. Synthesis and Characterization of Novel Low-k Polyimides from Aromatic Dianhydrides and Aromatic Diamine Containing Phenylene Ether and Perfluorobiphenyl Units

3. Low dielectric constant polymers for microelectronics

4. Mechanism of Dielectric Constant Variation of POSS-Based Organic−Inorganic Molecular Hybrids

5. Low-k Interlayer Dielectric Materials: Synthesis and Properties of Alkoxy-Functional Silsesquioxanes

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