Retention of surface structure causes lower density in atomic layer deposition of amorphous titanium oxide thin films-Reference-Cited by-同舟云学术

Retention of surface structure causes lower density in atomic layer deposition of amorphous titanium oxide thin films

Published:2021 Issue:11 Volume:23 Page:6600-6612
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Rich Benjamin B.¹²³⁴^ORCID,Etinger-Geller Yael¹²³⁴^ORCID,Ciatto Gianluca⁵⁶⁷⁸⁹,Katsman Alexander¹²³⁴,Pokroy Boaz¹²³⁴¹⁰^ORCID

Affiliation:

1. Department of Materials Science and Engineering

2. Technion – Israel Institute of Technology

3. Haifa 32000

4. Israel

5. Synchrotron SOLEIL

6. L'Orme des Merisiers

7. Saint-Aubin

8. 91192 Gif-sur-Yvette Cedex

9. France

10. Russell Berrie Nanotechnology Institute

Abstract

Size effects were investigated in thin amorphous TiO₂ ALD films. Significant changes in film density and Ti⁺³/Ti⁺⁴ species ratio were discovered; this was attributed to surface reconstruction and formation of oxygen vacancies during the ALD process.

Funder

H2020 European Research Council

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2021/CP/D1CP00341K

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