Ionic liquid based dopant-free band edge shift in BiVO<sub>4</sub> particles for photocatalysis under simulated sunlight irradiation-Reference-Cited by-同舟云学术

Ionic liquid based dopant-free band edge shift in BiVO₄ particles for photocatalysis under simulated sunlight irradiation

Published:2022 Issue:16 Volume:3 Page:6485-6495
ISSN:2633-5409
Container-title:Materials Advances
language:en
Short-container-title:Mater. Adv.

Author:

Khan Niqab¹,Wolff Rogério Nunes¹^ORCID,Ullah Hameed¹,Chacón Gustavo J.²^ORCID,Rosa Washington Santa³,Dupont Jairton²^ORCID,Gonçalves Renato Vitalino³^ORCID,Khan Sherdil¹^ORCID

Affiliation:

1. Laboratory of Nanomaterials for Renewable Energy and Artificial Photosynthesis (NanoREAP), Federal University of Rio Grande do Sul (UFRGS), Campus do Vale, Agronomia, Porto Alegre-RS, Brazil

2. Laboratory of Molecular Catalysis (LAMOCA), Federal University of Rio Grande do Sul (UFRGS), Campus do Vale, Agronomia, Porto Alegre-RS, Brazil

3. São Carlos Institute of Physics, University of São Paulo, PO Box 369, 13560-970 São Carlos, SP, Brazil

Abstract

Foreign element dopant-free Ionic liquid-based synthesis can shift the band edges of a semiconductor.

Funder

Fundação de Amparo à Pesquisa do Estado de São Paulo

Conselho Nacional de Desenvolvimento Científico e Tecnológico

Fundação de Amparo à Pesquisa do Estado do Rio Grande do Sul

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior

Publisher

Royal Society of Chemistry (RSC)

Subject