The influence of precursor on rhenium incorporation into Re-doped MoS2 (Mo1−xRexS2) thin films by aerosol-assisted chemical vapour deposition (AACVD)-Reference-Cited by-同舟云学术

The influence of precursor on rhenium incorporation into Re-doped MoS2 (Mo1−xRexS2) thin films by aerosol-assisted chemical vapour deposition (AACVD)

Published:2017 Issue:35 Volume:5 Page:9044-9052
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Al-Dulaimi Naktal¹²³^ORCID,Lewis Edward A.⁴²³,Savjani Nicky¹²³,McNaughter Paul D.¹²³^ORCID,Haigh Sarah J.⁴²³^ORCID,Malik M. Azad⁴²³,Lewis David J.⁴²³^ORCID,O’Brien Paul¹²³⁴²^ORCID

Affiliation:

1. School of Chemistry

2. The University of Manchester

3. UK

4. School of Materials

Abstract

The molecular precursors [Mo(S₂CNEt₂)₄] (1), [Re(S₂CC₆H₅)(S₃CC₆H₅)₂] (2), and [Re₂(μ-S)₂(S₂CNEt₂)₄] (3) were used to deposit thin films of Re-doped MoS₂.

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2017/TC/C7TC01903C

Reference35 articles.

1. Two-dimensional transition metal dichalcogenide (TMD) nanosheets

2. Optoelectronic properties of atomically thin ReSSe with weak interlayer coupling

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