Plasma enhanced atomic layer deposition of Fe2O3 thin films-Reference-Cited by-同舟云学术

Plasma enhanced atomic layer deposition of Fe2O3 thin films

Published:2014 Issue:27 Volume:2 Page:10662-10667
ISSN:2050-7488
Container-title:J. Mater. Chem. A
language:en
Short-container-title:J. Mater. Chem. A

Author:

Ramachandran Ranjith K.¹²³⁴,Dendooven Jolien¹²³⁴,Detavernier Christophe¹²³⁴

Affiliation:

1. Department of Solid State Sciences

2. COCOON

3. Ghent University

4. 9000 Ghent, Belgium

Abstract

We demonstrate an ALD process for Fe₂O₃ that relies upon sequential pulsing of ter-Butyl ferrocene (TBF) and O₂ plasma and enables the deposition from temperatures as low as 150 °C.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2014/TA/C4TA01486C

Reference55 articles.

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2. Magnetoresistance of sintered (Fe2O3)100−x(Fe3O4)x ferrites

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4. High-Quality Fe and γ-Fe2O3 Magnetic Thin Films from an Epoxide-Catalyzed Sol−Gel Process

5. Supported ε and β iron oxide nanomaterials by chemical vapor deposition: structure, morphology and magnetic properties

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