Super-resolution interference lithography enabled by non-equilibrium kinetics of photochromic monolayers-Reference-Cited by-同舟云学术

Super-resolution interference lithography enabled by non-equilibrium kinetics of photochromic monolayers

Published:2019 Issue:49 Volume:9 Page:28841-28850
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Vijayamohanan Harikrishnan¹²³⁴,Kenath Gopal S.¹²³⁴,Palermo Edmund F.¹²³⁴^ORCID,Ullal Chaitanya K.¹²³⁴^ORCID

Affiliation:

1. Department of Materials Science and Engineering

2. Rensselaer Polytechnic Institute

3. Troy NY 12180

4. USA

Abstract

The non-equilibrium kinetics of spirothiopyran monolayers are studied to enable large area interference lithography with feature dimensions that circumvent the diffraction barrier.

Funder

Division of Biological Infrastructure

New York State Foundation for Science, Technology and Innovation

Division of Chemistry

Division of Engineering Education and Centers

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2019/RA/C9RA05864H

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