Interplay among work function, electronic structure and stoichiometry in nanostructured VOx films

Author:

D’Elia Alessandro12345ORCID,Cepek Cinzia5674,de Simone Monica5674ORCID,Macis Salvatore1894,Belec Blaž10111213,Fanetti Mattia10111213,Piseri Paolo1415164,Marcelli Augusto171819420ORCID,Coreno Marcello21227423ORCID

Affiliation:

1. Department of Physics

2. University of Trieste

3. 34127 Trieste

4. Italy

5. IOM-CNR

6. Laboratorio TASC

7. 34149 Trieste

8. Università Sapienza

9. 00185 Rome

10. Materials Research Laboratory

11. University of Nova Gorica

12. 5000 Nova Gorica

13. Slovenia

14. Dipartimento di Fisica & CIMaINa

15. Università degli Studi di Milano

16. 20133 Milano

17. Istituto Nazionale di Fisica Nucleare

18. Laboratori Nazionali di Frascati

19. 00044 Frascati

20. Rome International Centre for Material Science Superstripes

21. ISM-CNR

22. Istituto Struttura della Materia

23. Elettra-Sincrotrone Trieste

Abstract

The work function is the parameter of greatest interest in many technological applications involving charge exchange mechanisms at the surface.

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

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