Optimized study of the annealing effect on the electrical and structural properties of HDLC thin-films-Reference-Cited by-同舟云学术

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Optimized study of the annealing effect on the electrical and structural properties of HDLC thin-films

Published:2022 Issue:46 Volume:12 Page:29805-29812
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Biswas Hari Shankar¹^ORCID,Datta Jagannath²,Mandal Prasenjit³,Poddar Sandeep⁴^ORCID,Kundu Amit Kumar⁵,Saha Indranil⁵

Affiliation:

1. Department of Chemistry, Surendranath College, Kolkata 700 009, India

2. Analytical Chemistry Division, BARC, Variable Energy Cyclotron Centre, Kolkata 700 064, India

3. Department of Chemistry, Santipur College, Nadia, Pin: 741 404, West Bengal, India

4. Lincoln University College, Petaling Jaya-47301, Malaysia

5. Department of Chemistry, Sripat Singh College, Jiaganj-742 123, Murshidabad, West Bengal, India

Abstract

The plasma-enhanced chemical vapor deposition (PECVD) technique has been utilized for the facile surface deposition of hydrogenated diamond-like carbon (HDLC) thin-films onto Si(100) substrates.

Funder

University Grants Commission

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2022/RA/D2RA06255K

Reference37 articles.

1. Ion‐Beam Deposition of Thin Films of Diamondlike Carbon

2. Diamond-like carbon protective anti-reflection coating for Si solar cell

3. Low resistive diamond like carbon film development technique

4. Resistivity of chemical vapor deposited diamond films

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