Direct and nitrite-sensitized indirect photolysis of effluent-derived phenolic contaminants under UV254 irradiation-Reference-Cited by-同舟云学术

Direct and nitrite-sensitized indirect photolysis of effluent-derived phenolic contaminants under UV254 irradiation

Published:2022 Issue:1 Volume:24 Page:127-139
ISSN:2050-7887
Container-title:Environmental Science: Processes & Impacts
language:en
Short-container-title:Environ. Sci.: Processes Impacts

Author:

Li Yueyue¹,Wang Lixiao¹,Xu Haiyan¹,Lu Junhe¹,Chovelon Jean-Marc²,Ji Yuefei¹^ORCID

Affiliation:

1. College of Resources and Environmental Sciences, Nanjing Agricultural University, Nanjing 210095, China

2. Univ Lyon, Université Claude Bernard Lyon 1, CNRS, IRCELYON, F-69626, Villeurbanne, France

Abstract

Nitrite at the WWTP effluent-relevant level sensitized the photolysis of effluent-derived phenolic contaminants during the UV254 disinfection process.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

Management, Monitoring, Policy and Law,Public Health, Environmental and Occupational Health,Environmental Chemistry,General Medicine

Link

http://pubs.rsc.org/en/content/articlepdf/2022/EM/D1EM00381J

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