Surface accumulation and acid–base equilibrium of phenol at the liquid–vapor interface-Reference-Cited by-同舟云学术

Surface accumulation and acid–base equilibrium of phenol at the liquid–vapor interface

Published:2024 Issue: Volume: Page:
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Richter Clemens¹^ORCID,Dupuy Rémi²,Trinter Florian¹^ORCID,Buttersack Tillmann¹^ORCID,Cablitz Louisa¹,Gholami Shirin¹,Stemer Dominik¹^ORCID,Nicolas Christophe³,Seidel Robert⁴^ORCID,Winter Bernd¹^ORCID,Bluhm Hendrik¹

Affiliation:

1. Fritz Haber Institute of the Max Planck Society, Faradayweg 4–6, 14195 Berlin, Germany

2. CNRS, Laboratoire de Chimie Physique – Matière et Rayonnement, Sorbonne Université, F-75005 Paris Cedex 05, France

3. Synchrotron SOLEIL, L’Orme des Merisiers, Saint-Aubin – BP 48 91192, Gif-sur-Yvette Cedex, France

4. Helmholtz-Zentrum Berlin für Materialien und Energie, Hahn-Meitner-Platz 1, 14109 Berlin, Germany

Abstract

We have investigated the surfactant properties of phenol in aqueous solution as a function of pH and bulk concentration using liquid-jet photoelectron spectroscopy (LJ-PES) and surface tension measurements.

Funder

Alexander von Humboldt-Stiftung

Deutsche Forschungsgemeinschaft

H2020 European Research Council

Publisher

Royal Society of Chemistry (RSC)

Link

http://pubs.rsc.org/en/content/articlepdf/2024/CP/D4CP02212B

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