Stable nanoporous thin films through one-step UV treatment of a block copolymer precursor-Reference-Cited by-同舟云学术

Stable nanoporous thin films through one-step UV treatment of a block copolymer precursor

Author:

Ma Xia¹²³⁴,Sui Xin⁵⁶²³⁴,Zhang Zhenyu⁷⁸⁹¹⁰³,Li Chao⁵⁶²³⁴,Zhang Naifu⁵⁶²³⁴,Chen Aihua¹²³⁴^ORCID,Xie Qiong¹¹³⁴,Gao Longcheng⁵⁶²³⁴

Affiliation:

1. School of Materials Science and Engineering

2. Beihang University

3. Beijing

4. P. R. China

5. Key Laboratory of Bio-inspired Smart Interfacial Science and Technology of Ministry of Education

6. School of Chemistry and Environment

7. Beijing National Laboratory for Molecular Sciences

8. Key Laboratory of Polymer Chemistry and Physics of Ministry of Education

9. College of Chemistry and Molecular Engineering

10. Peking University

11. China Astronaut Research and Training Center

Abstract

Stable nanoporous structures was fabricated from a self-assembled block copolymer precursor by one-step UV treatment.

Funder

Beijing Nova Program

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

Reference36 articles.

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