Plasmon-assisted nanojet lithography
Author:
Affiliation:
1. Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education of China
2. School of Physics and Technology
3. Wuhan University
4. Wuhan 430072
5. China
Abstract
Laser irradiation (CW, 446 nm) of gold nanoparticles generates cavities underneath polystyrene (PS) films, with sizes ranging from ∼100 to 500 nm, depending on the applied laser power. The etching mechanism is based on the near-field-assisted photoablation of PS films and gold nanoparticles, including both photothermal and photochemical aspects, enriching the toolbox of nanolithography.
Funder
National Natural Science Foundation of China
Fundamental Research Funds for the Central Universities
Publisher
Royal Society of Chemistry (RSC)
Subject
General Materials Science
Link
http://pubs.rsc.org/en/content/articlepdf/2019/NR/C8NR08834A
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