Infrared photodissociation of (NO)n+·X cluster ions (n ≤ 5)
Author:
Publisher
Royal Society of Chemistry (RSC)
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://pubs.rsc.org/en/content/articlepdf/2005/CP/B416196C
Reference38 articles.
1. The binding energy between NO and NO+
2. Molecular beam photoionization study of CO, N2, and NO dimers and clusters
3. Multiphoton ionization of nitric oxide-rare gas van der Waals species
4. Investigation of the dynamics and energy disposal in the photodissociation of small ion clusters using a high‐energy ion beam crossed with a laser beam: Photodissociation of (NO)2+. in the 488–660 nm range
5. The dynamics of photodissociation of cluster ions. II. Photodissociation of the (NO)+3 cluster in the visible wavelength range
Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Application of continuous wave quantum cascade laser in combination with CIVP spectroscopy for investigation of large organic and organometallic ions;Review of Scientific Instruments;2021-08-01
2. Adsorption and valence electronic states of nitric oxide on metal surfaces;Surface Science Reports;2021-03
3. Eosin Thermoluminescence in Polyvinyl Alcohol Films After Doubl Vis-IR Laser Excitation in a Wide Temperature Range;Journal of Applied Spectroscopy;2019-05
4. Dynamics of Thermoluminescence under Dual-Wavelength Vis–IR Laser Excitation of Eosin Molecules in a Polyvinyl Butyral Film Containing Oxygen and Silver Nanoparticles;Optics and Spectroscopy;2018-12
5. Thermal Dynamics of Xanthene Dye in Polymer Matrix Excited by Double Pulse Laser Radiation;Journal of Physics: Conference Series;2018-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3