Modelling the growth reaction pathways of zincone ALD/MLD hybrid thin films: a DFT study-Reference-Cited by-同舟云学术

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Modelling the growth reaction pathways of zincone ALD/MLD hybrid thin films: a DFT study

Published:2024 Issue:24 Volume:26 Page:17334-17344
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Mäkinen Mario¹^ORCID,Weckman Timo²^ORCID,Laasonen Kari¹^ORCID

Affiliation:

1. Department of Chemistry and Materials Science, School of Chemical Engineering, Aalto University, Kemistintie 1, 02150, Espoo, Finland

2. Department of Chemistry, University of Jyväskylä, Survontie 9 B, 40500, Jyväskylä, Finland

Abstract

ALD/MLD hybrid thin films can be fabricated by combining atomic layer deposition (ALD) and molecular layer deposition (MLD). The growth reactions of these hybrid thin films were studied using density functional theory (DFT).

Funder

Suomen Kulttuurirahasto

Jane ja Aatos Erkon Säätiö

Publisher

Royal Society of Chemistry (RSC)

Link

http://pubs.rsc.org/en/content/articlepdf/2024/CP/D4CP00249K

Reference37 articles.

1. M.Mäkinen , Structural Data for the Zincone ALD/MLD Hybrid Thin Film Growth Reactions, 2023 , Harvard Dataverse, V2 10.7910/dvn/wfvehm

2. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

3. Organic and inorganic–organic thin film structures by molecular layer deposition: A review

4. Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

5. Atomic layer deposition of ZnO: a review

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