Tungsten diselenide for all-fiber lasers with the chemical vapor deposition method-Reference-Cited by-同舟云学术

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Tungsten diselenide for all-fiber lasers with the chemical vapor deposition method

Published:2018 Issue:17 Volume:10 Page:7971-7977
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Liu Wenjun¹²³⁴⁵^ORCID,Liu Mengli¹²³⁴⁵,Yin Jinde⁶⁷⁸⁹⁵,Chen Hao⁶⁷⁸⁹⁵,Lu Wei¹⁰¹¹¹²¹³,Fang Shaobo¹⁴¹⁵¹⁶¹⁷⁵,Teng Hao¹⁴¹⁵¹⁶¹⁷⁵,Lei Ming¹²³⁴⁵,Yan Peiguang⁶⁷⁸⁹⁵^ORCID,Wei Zhiyi¹⁴¹⁵¹⁶¹⁷⁵

Affiliation:

1. State Key Laboratory of Information Photonics and Optical Communications

2. School of Science

3. Beijing University of Posts and Telecommunications

4. Beijing 100876

5. China

6. Shenzhen Key Laboratory of Laser Engineering

7. College of Optoelectronic Engineering

8. Shenzhen University

9. Shenzhen 518060

10. University Research Facility in Materials Characterization and Device Fabrication

11. Hong Kong Polytechnic University

12. Kowloon

13. Hong Kong

14. Beijing National Laboratory for Condensed Matter Physics

15. Institute of Physics

16. Chinese Academy of Sciences

17. Beijing 100190

Abstract

The laser induced damage threshold and modulation depth of SAs are prominently improved with WSe₂ films.

Funder

National Natural Science Foundation of China

Beijing University of Posts and Telecommunications

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2018/NR/C8NR00471D

Reference61 articles.

1. Atomic-Layer Graphene as a Saturable Absorber for Ultrafast Pulsed Lasers

2. Z-scan measurement of the nonlinear refractive index of graphene

3. Graphene Photonics, Plasmonics, and Broadband Optoelectronic Devices

4. Large energy mode locking of an erbium-doped fiber laser with atomic layer graphene

5. Graphene Mode-Locked Ultrafast Laser

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