Fluorous-inorganic hybrid dielectric materials for solution-processed electronic devices-Reference-Cited by-同舟云学术

Fluorous-inorganic hybrid dielectric materials for solution-processed electronic devices

Published:2015 Issue:2 Volume:39 Page:836-842
ISSN:1144-0546
Container-title:New Journal of Chemistry
language:en
Short-container-title:New J. Chem.

Author:

Kim Heejin¹²³⁴,Jo Sang Ho⁵⁶⁷⁴,Jee Joong-Hwi¹²³⁴,Han WooJe⁸⁹¹⁰⁴,Kim Youngtae¹²³⁴,Park Hyung-Ho⁸⁹¹⁰⁴,Jin Hyoung-Joon¹²³⁴,Yoo Byungwook⁵⁶⁷⁴,Lee Jin-Kyun¹²³⁴

Affiliation:

1. Department of Polymer Science and Engineering

2. Inha University

3. Incheon 402-751

4. South Korea

5. Korea Electronics Technology Institute

6. Seongnam-si

7. Gyeonggi-do

8. Department of Materials Science and Engineering

9. Yonsei University

10. Seoul 120-749

Abstract

Fluorous-inorganic hybrid dielectric (FIHD) materials in fluorous solvents can be deposited on top of organic semiconductor films by solution casting.

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry,Catalysis

Link

http://pubs.rsc.org/en/content/articlepdf/2015/NJ/C4NJ01435A

Reference51 articles.

1. Development of High-Performance Organic Thin-Film Transistors for Large-Area Displays

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5. Organic thin film transistors with novel thermally cross-linked dielectric and printed electrodes on flexible substrates

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