Infrared spectroscopy depth profiling of organic thin films-Reference-Cited by-同舟云学术

Infrared spectroscopy depth profiling of organic thin films

Published:2021 Issue:5 Volume:8 Page:1461-1471
ISSN:2051-6347
Container-title:Materials Horizons
language:en
Short-container-title:Mater. Horiz.

Author:

Yu Jinde¹²³⁴,Xing Yifan¹²³⁴,Shen Zichao¹²³⁴,Zhu Yuanwei¹²³⁴,Neher Dieter⁵⁶⁷^ORCID,Koch Norbert⁸⁹¹⁰⁷¹¹^ORCID,Lu Guanghao¹²³⁴^ORCID

Affiliation:

1. Frontier Institute of Science and Technology and State Key Laboratory of Electrical Insulation and Power Equipment

2. Xi’an Jiaotong University

3. Xi’an

4. China

5. Institut für Physik und Astronomie, Universität Potsdam

6. Potsdam 14476

7. Germany

8. Institut für Physik & IRIS Adlershof

9. Humboldt-Universität zu Berlin

10. Berlin 12489

11. Helmholtz-Zentrum Berlin für Materialien und Energie GmbH

Abstract

FDD-IR spectra combined with soft plasma etching is introduced to study organic film property along film-depth. It provides insights into different kinds of organic films, all equipment and methodology are easily accessible in laboratories worldwide.

Funder

China Postdoctoral Science Foundation

National Natural Science Foundation of China

Fundamental Research Funds for the Central Universities

Publisher

Royal Society of Chemistry (RSC)

Subject

Electrical and Electronic Engineering,Process Chemistry and Technology,Mechanics of Materials,General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2021/MH/D0MH02047H

Reference52 articles.

1. Organic Optoelectronic Materials: Mechanisms and Applications