On the nature of niobium substitution in niobium doped titania thin films by AACVD and its impact on electrical and optical properties-Reference-Cited by-同舟云学术

On the nature of niobium substitution in niobium doped titania thin films by AACVD and its impact on electrical and optical properties

Published:2015 Issue:34 Volume:3 Page:17755-17762
ISSN:2050-7488
Container-title:Journal of Materials Chemistry A
language:en
Short-container-title:J. Mater. Chem. A

Author:

Gardecka A. J.¹²³⁴⁵,Goh G. K. L.⁶⁷⁸,Sankar G.¹²³⁴⁵,Parkin I. P.¹²³⁴⁵

Affiliation:

1. Materials Chemistry Centre

2. Department of Chemistry

3. University College London

4. London WC1H 0AJ

5. UK

6. Institute of Materials Research and Engineering

7. Agency for Science, Technology and Research (A*STAR)

8. Singapore 117602

Abstract

Niobium doped TiO₂ thin films were deposited on silica coated glass substrate using aerosol assisted chemical vapour deposition (AACVD) from hexane solution, at 500 °C.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/TA/C5TA03772G

Reference47 articles.

1. Effect of niobium on the structure of titanium dioxide thin films

2. Combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of niobium doped anatase; effect of niobium on the conductivity and photocatalytic activity

3. An overview of semiconductor photocatalysis

4. www.pilkington.com

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