Stable negative differential resistance in porphyrin based σ–π–σ monolayers grafted on silicon-Reference-Cited by-同舟云学术

Stable negative differential resistance in porphyrin based σ–π–σ monolayers grafted on silicon

Published:2015 Issue:62 Volume:5 Page:50234-50244
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Garg Kavita¹²³⁴,Majumder Chiranjib⁵²³⁴,Gupta Shiv Kumar⁶²³⁴,Aswal Dinesh Kumar⁶²³⁴,Nayak Sandip Kumar¹²³⁴,Chattopadhyay Subrata¹²³⁴

Affiliation:

1. Bio-Organic Division

2. Bhabha Atomic Research Centre

3. Mumbai

4. India

5. Chemistry Division

6. Technical Physics Division

Abstract

Two Si–porphyrin hybrid monolayers showed room temperature negative differential resistance (NDR) property. The monolayer with a fluorophenyl porphyrin moiety showed a better peak-to-valley ratio due to compact packing.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/RA/C5RA09484D

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