Fine-tuning of the dielectric properties of polysiloxanes by chemical modification-Reference-Cited by-同舟云学术

Fine-tuning of the dielectric properties of polysiloxanes by chemical modification

Published:2015 Issue:62 Volume:5 Page:50054-50062
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Dünki Simon J.¹²³⁴⁵,Tress Martin⁶⁷⁸⁹,Kremer Friedrich⁶⁷⁸⁹,Ko Song Yee¹²³⁴⁵,Nüesch Frank A.¹²³⁴⁵,Varganici Cristian-Dragos¹⁰¹¹¹²,Racles Carmen¹⁰¹¹¹²,Opris Dorina M.¹²³⁴⁵

Affiliation:

1. Empa

2. Swiss Federal Laboratories for Materials Science and Technology

3. Laboratory for Functional Polymers

4. Dübendorf

5. Switzerland

6. Institute of Experimental Physics I

7. University of Leipzig

8. 04103 Leipzig

9. Germany

10. Petru Poni Institute of Macromolecular Chemistry

11. Iasi

12. Romania

Abstract

Novel polysiloxanes with dielectric properties which are systematically fine-tuned by utilizing thiol-ene post-polymerization reactions of a polymethylvinylsiloxane with various ratios of 1-butanethiol and 3-mercaptopropionitrile is presented.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/RA/C5RA07412F

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