Novel base-sensitive polymers generating amino groups from their side chains in a nonlinear manner and their application to photoimaging materials
Author:
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2008/JM/B710142B
Reference41 articles.
1. Lithographic Evaluation of an o‐Nitrobenzyl Ester Based Deep U.V. Resist System
2. The Effect of Substituents on the Photosensitivity of 2‐Nitrobenzyl Ester Deep U.V. Resists
3. Approaches to the Design of Radiation‐Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution
4. Nitrobenzyl ester chemistry for polymer processes involving chemical amplification
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