Origin of the 29Si NMR chemical shift in R3Si–X and relationship to the formation of silylium (R3Si+) ions-Reference-Cited by-同舟云学术

Origin of the 29Si NMR chemical shift in R3Si–X and relationship to the formation of silylium (R3Si+) ions

Published:2020 Issue:45 Volume:49 Page:16453-16463
ISSN:1477-9226
Container-title:Dalton Transactions
language:en
Short-container-title:Dalton Trans.

Author:

Huynh Winn¹²³⁴,Conley Matthew P.¹²³⁴^ORCID

Affiliation:

1. Department of Chemistry

2. University of California

3. Riverside

4. USA

Abstract

The origin in deshielding of ²⁹Si NMR chemical shifts in R₃Si–X, where X = H, OMe, Cl, OTf, [CH₆B₁₁X₆], toluene, and O_X (O_X = surface oxygen), as well as ⁱPr₃Si⁺ and Mes₃Si⁺ were studied using DFT methods.

Funder

National Science Foundation

Publisher

Royal Society of Chemistry (RSC)

Subject

Inorganic Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2020/DT/D0DT02099K

Reference60 articles.

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