A new etching process for zinc oxide with etching rate and crystal plane control: experiment, calculation, and membrane application-Reference-Cited by-同舟云学术

A new etching process for zinc oxide with etching rate and crystal plane control: experiment, calculation, and membrane application

Published:2019 Issue:25 Volume:11 Page:12337-12346
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Chung Jiyong¹²³⁴⁵,Lee Jeong Hee⁶³⁷⁵⁸,Kim Kyeounghak¹⁹¹⁰⁵^ORCID,Lee Jaeyoung¹²³⁴⁵,Yoo Sung Jong⁶³⁷⁵⁸^ORCID,Han Jeong Woo¹⁹¹⁰⁵^ORCID,Kim Jinsoo¹²³⁴⁵,Yu Taekyung¹²³⁴⁵^ORCID

Affiliation:

1. Department of Chemical Engineering

2. College of Engineering

3. Kyung Hee University

4. Yongin 17140

5. Korea

6. Department of KHU-KIST Converging Science and Technology

7. Seoul 02447

8. Fuel Cell Research Center

9. Pohang University of Science and Technology (POSTECH)

10. Pohang

Abstract

The etching process can be a useful method for the morphology control of nanostructures.

Funder

National Research Foundation of Korea

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2019/NR/C9NR02248A

Reference39 articles.

1. Shape-Controlled Synthesis of Gold and Silver Nanoparticles

2. Shape-Controlled Synthesis of Metal Nanocrystals: Simple Chemistry Meets Complex Physics?

3. ZnO Nanostructures for Dye-Sensitized Solar Cells

4. Ultrahigh stress and strain in hierarchically structured hollow nanoparticles

5. Ionic Liquid as the C and N Sources to Prepare Yolk-shell Fe3O4@N-doped Carbon Nanoparticles and its High Performance in Lithium-ion Battery

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