The first atomic layer deposition process for FexN films

Author:

Du Liyong12345,Huang Wei12345,Zhang Yuxiang12345,Liu Xinfang67895,Ding Yuqiang12345ORCID

Affiliation:

1. International Joint Research Center for Photoresponsive Molecules and Materials

2. School of Chemical and Material Engineering

3. Jiangnan University

4. Wuxi, 214122

5. P. R. China

6. Henan Key Laboratory of Function-Oriented Porous Materials

7. College of Chemistry and Chemical Engineering

8. Luoyang Normal University

9. Luoyang 471934

Abstract

An efficient process for ALD FexN films was reported in this study for the first time.

Funder

China Postdoctoral Science Foundation

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,General Chemistry,Ceramics and Composites,Electronic, Optical and Magnetic Materials,Catalysis

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