Mechanism of tetraborate and silicate ions on the growth kinetics of microarc oxidation coating on a Ti6Al4V alloy

Author:

Zhai Dajun1,Qiu Tao1,Shen Jun1ORCID,Feng Keqin2

Affiliation:

1. College of Materials Science and Engineering, Chongqing University, Chongqing 400044, China

2. College of Mechanical Engineering, Sichuan University, Chengdu 610065, China

Abstract

B4O72− dissolves molten TiO2 at high temperature, exposing filamentary channels and resulting in the repeated nucleation of microarc in the same area. SiO2 formed from SiO32− blocks the channels and induces microarc nucleation in other regions.

Funder

China Postdoctoral Science Foundation

Chongqing Postdoctoral Science Foundation

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

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